Amplified Photoresists Direct Measurement of the Reaction Front in
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Direct measurement of the reaction front in chemically amplified photoresists.
The continuing drive by the semiconductor industry to fabricate smaller structures using photolithography will soon require dimensional control at length scales comparable to the size of the polymeric molecules in the materials used to pattern them. The current technology, chemically amplified photoresists, uses a complex reaction-diffusion process to delineate patterned areas with high spatial...
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